Image: (a) Dependence of LIPSS period on film thicknesses and substrates. SEM images of stationary irradiation-induced periodic nanostructures on different thicknesses of a-Si film: (b) 50 nm on glass and (c) 200 nm on c-Si. Scale bars: 1 µm. (IMAGE)

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Image: (a) Dependence of LIPSS period on film thicknesses and substrates. SEM images of stationary irradiation-induced periodic nanostructures on different thicknesses of a-Si film: (b) 50 nm on glass and (c) 200 nm on c-Si. Scale bars: 1 µm.

Caption

Image: (a) Dependence of LIPSS period on film thicknesses and substrates. SEM images of stationary irradiation-induced periodic nanostructures on different thicknesses of a-Si film: (b) 50 nm on glass and (c) 200 nm on c-Si. Scale bars: 1 µm.

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Liye Xu, Jiao Geng, Liping Shi, Weicheng Cui, Min Qiu

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